The Pi111 PLUS G3 is the third generation of PLATIT’s small PVD coating unit. It offers short cycle times, simple operation and high user-friendliness at an attractive price – without compromising on coating performance. Thanks to two rotating cathodes with arc technology, the unit enables to deposit selected PLATIT Signature Coatings in reproducible high-quality.
The Pi111 PLUS G3 is the best choice for customers looking for a high-quality entry into the coating world or those who want to add a fast, low-volume PVD unit to their machinery.
Compare the advantages of LARC® PLUS cathodes versus LARC® cathodes:
Several etching technologies can be used with the PLATIT Pi111 coating units, offering various advantages: